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Simulation and Comparison of Voltage and Current Characteristics of Novel Finfet by Varying its Oxide Thickness with Single Gate Mosfet for Improved Conductivity

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T. Kiran Kumar Reddy • A. Deepak

Abstract

Aim: The current and voltage characteristics of FinFET and single gate MOSFET are simulated by varying their oxide thickness ranging from 2 nm to 20 nm. Materials and Methods: The electrical conductance of FINFET (n= 320) was compared with MOSFET (n=320) by varying oxide thickness ranging from 2 nm to 20 nm in the NANO HUB tool simulation environment.

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